City of Industry, CA -- (SBWIRE) -- 09/19/2018 -- This study focuses on the production side and consumption side of Nanoimprint Lithography System, presents the global Nanoimprint Lithography System market size by manufacturers, regions, type and application, history breakdown data from 2013 to 2018, and forecast to 2025.

In terms of production side, this report researches the Nanoimprint Lithography System capacity, production, value, ex-factory price, growth rate, market share for major manufacturers, regions (or countries) and product type.

In terms of consumption side, this report focuses on the consumption of Nanoimprint Lithography System by regions and application. The key regions like North America, Europe, Asia-Pacific, Central & South America, Middle East and Africa etc.

Imprinting technology is an ancient technique for the reproduction of writings on appropriate supports. Since 1990´s, one of the imprinting techniques, i.e., injection moulding has been used for compact disk (CD) production. More recently, the semiconductor industry is interested in imprint related techniques because of the mass production requirement of future microelectronic circuits with a possible critical dimension down to a few nanometers. At this deep nanometer scale, traditional photolithography is supposed to rule out because of the optical diffraction or material limitations. In fact, the actual minimum feature size in an integrated circuit (IC) is already less than 50 nm and the actual manufacturing systems are already extremely sophisticated and expensive. The semiconductor industry has always been looking for alternative patterning methods in order to follow Moore´s law, which has been formulated to predict the evolution of the technology nodes. Now, extreme UV lithography (EUV), 193 nm immersion lithography, mask less lithography (MLL) techniques and nanoimprint lithography (NIL) are considered as candidates for the so called Next Generation Lithography (NGL) at 32 nm and 22 nm nodes. In parallel, imprint technology has been promoted by a large scientific community and non-IC industry segments including high-density storage, optoelectronics, telecommunication as well as biochips or micro total analysis systems.

Nanoimprint lithography is a method of fabricating nanometer scale patterns. It is a simple nanolithography process with low cost, high throughput and high resolution. It creates patterns by mechanical deformation of imprint resist and subsequent processes. The imprint resist is typically a monomer or polymer formulation that is cured by heat or UV light during the imprinting. Adhesion between the resist and the template is controlled to allow proper release.

With regards to this, key players of nanoimprint lithography system industry are expected to find potential opportunities in this market. The world leading vendors in the market are Obducat which accounted the revenue market share of 35.90%, followed by EV Group and Canon.

The Nanoimprint Lithography System market was valued at 49 Million US$ in 2017 and is projected to reach 92 Million US$ by 2025, at a CAGR of 8.2% during the forecast period. In this study, 2017 has been considered as the base year and 2018 to 2025 as the forecast period to estimate the market size for Nanoimprint Lithography System.

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This report includes the following manufacturers; we can also add the other companies as you want.

Obducat

EV Group

Canon (Molecular Imprints)

Nanonex

SUSS MicroTec

GuangDuo Nano

Market Segment by Product Type

Hot Embossing (HE)

UV-based Nanoimprint Lithography (UV-NIL)

Micro Contact Printing (µ-CP)

Market Segment by Application

Consumer Electronics

Optical Equipment

Others

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